Persistence of Oxyfluorfen at Different Temperature and Moisture Levels in Alfisol and Vertisol
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Author:A. Sireesha, P. Chandrasekhar Rao and Ch. S. Ramalaxmi
p-ISSN:0024-9602, e-ISSN:2582-5321, Vol:99, Issue:jul-sep
DOI: https://doi.org/10.29321/MAJ.10.100118
Abstract
Persistence of oxyfluorfen in Alfisol and Vertisol was studied at three moisture levels (at
saturation, FC and 50 % FC) and at two temperature levels (10+ 2 0
C and 27 + 2 0
C ) for the period
of 137 days in the laboratory. Degradation of oxyfluorfen was more rapid at high temperature
and moisture levels. The disappearance curve / semi logarithmic plot followed first order
kinetics with two distinct pathways, an initial faster rate followed by a slower and more
gradual disappearance. The rate of degradation of oxyfluorfen increased with increase in
temperature from 10 0
C to 27 0 C. In the present investigation for oxyfluorfen the rate of reentry
into labile pool was considered negligible. The rate of entry into bound pool was higher for
Vertisol than for Alfisol and was higher at higher temperature. It decreased with soil moisture
in the order: saturation > field capacity > 50% field capacity. At high temperature and moisture
level, the half values were lower compared to low temperature and moisture level. Persistence
of oxyfluorfen was varied by more than 30 per cent between the field studies and laboratory
studies.
Key words : Oxyfluorfen, persistence, Half life values, temperature and moisture levels, alfisol, vertisol.